We are pleased to announce the kick- off meeting of the collaborative research project ‘’NANOMET’’ entitled ‘’Advanced inline nano-metrology techniques for roll to roll nanoimprint lithography manufacturing processes’’.
High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography
Check out our latest publication on how NIL can facilitate the fabrication of DOE structures with organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold....
