Researchers from #Nanotypos visited #Creative Nano facilities to discuss progress on common scientific interests as partners in the EU funded project #BIOMAC.
Thank you #Crative Nano for the hospitality we are expecting you in our premises in Thessaloniki.
High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography
Check out our latest publication on how NIL can facilitate the fabrication of DOE structures with organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold....