High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Published: July 26, 2021
Posted In: News

High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Check out our latest publication on how NIL can facilitate the fabrication of DOE structures with organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold.

https://www.degruyter.com/document/doi/10.1515/nanoph-2021-0263/html?fbclid=IwAR3q-k0HIbkoGvn5gCQkVJ_f-MOQQgBC4s-18LglQXz_P0W5iCjYpkB-xjo 

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